67674-48-0 | 2-Propanol, 1,1,1,3,3,3-hexafluoro-, 4-methylbenzenesulfonate

CAS:67674-48-0 | 2-Propanol, 1,1,1,3,3,3-hexafluoro-, 4-methylbenzenesulfonate ,Description

2-Propanol, 1,1,1,3,3,3-hexafluoro-, 4-methylbenzenesulfonate (HF-MBS) is an organic compound that has a variety of uses in scientific research. It is a colorless, volatile liquid with a low vapor pressure and a pungent odor. It is a very versatile compound that can be used in a variety of laboratory experiments, including organic synthesis, chromatography, and spectroscopy. It is also used as a reagent in the synthesis of other organic compounds.
 

Scientific Research Applications

Hydrogen Bonding and Cluster Stability

Fourier transform infrared (FTIR) spectra analysis of 2-propanol and its fluorinated derivatives, including 1,1,1,3,3,3-hexafluoro-2-propanol (HFIP), has been used to investigate hydrogen bonding, cluster stability, and conformational isomerism. These studies provide insights into the effects of methyl group fluorination on the strength of hydrogen bonds and the stability of clusters, which are crucial for understanding intramolecular torsional isomerization dynamics and its coupling to intermolecular hydrogen bonding (Schaal, Häber, & Suhm, 2000).

Catalysis in Organic Synthesis

1,1,1,3,3,3-Hexafluoro-2-propanol (HFIP) has been reported to act as both a solvent and a catalyst in the Pictet–Spengler reaction between tryptamine derivatives and aldehydes or activated ketones. This application highlights the role of HFIP in facilitating organic reactions, leading to high yields of tetrahydro-β-carbolines by simply removing the low boiling point HFIP by distillation (Wang, Shen, & Qu, 2014) .

Material Science and Film Casting

The use of HFIP as a processing solvent for orthogonal alignment of DNA–surfactant complexes demonstrates its utility in material science, specifically in the creation of films with unique electrical properties. This research indicates that films cast from HFIP exhibit higher, more consistent dielectric constants and lower dissipation factors compared to films cast from other solvents, which could have implications for electronic and photonic applications (Mamangun, Santana, Ouchen, Grote, & Sotzing, 2014).

Photolithography and Polymer Resists

Research into the sulfonation of oximes by reaction with 4-methylbenzenesulfonyl chloride, where 2-Propanol, 1,1,1,3,3,3-hexafluoro-, 4-methylbenzenesulfonate may act as a reagent or solvent, explores the potential of these compounds as photoacid generators in polymer resists. This application is crucial for the development of photolithographic processes in semiconductor manufacturing, indicating a route to liberate acid upon irradiation and drive the development of fine patterns on resists (Plater, Harrison, & Killah, 2019).

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