73609-36-6 | Dichloromethyl(3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctyl)silane

CAS:73609-36-6 | Dichloromethyl(3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctyl)silane ,Description

Dichloromethyl(3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctyl)silane (DCFOS) is a chlorosilane compound that was discovered in the early 2000s. It is a colorless, odorless, and volatile liquid, and it is used as a reagent in organic synthesis and as a catalyst in various industrial processes. DCFOS is also used in the production of polymers, surfactants, and other materials. In addition, it is used in the production of pharmaceuticals, agrochemicals, and biocides.
 

Scientific Research Applications

Synthesis and Modification of Polyfluoroorganosiloxane Resins

The hydrolytic cocondensation of trichloro (3,3,3-trifluoropropyl) silane with dichlorodimethyl-, dichloromethylphenyl-, and dichloromethyl (3,3,3-trifluoropropyl)-silanes leads to the synthesis of polyfluoroorganosiloxane resins. These resins show significant thermal stability, not decomposing below 350–435° in air and 460° in argon, indicating potential for high-performance applications in various fields including materials science (V. Ponomarenko, N. M. Khomutova, I. F. Manucharova, 1966).

Creation of Highly Fluorous Compounds for Partition Coefficients Study

A series of new compounds with tris(3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctyl)silyl substituents were synthesized to explore their partition coefficients between fluorous and organic phases. These studies are essential for understanding the fluorous phase behavior in applications such as liquid-liquid extraction and chromatography (Tomáš Strašák, L. Šťastná, V. Bílková, Veronika Skoupá, J. Karban, P. Cuřínová, J. Čermák, 2015 ).

Surface Functionalization and Modification

Silane monolayers on silica surfaces, prepared from various chlorosilanes, are widely used for surface functionalization and modification. The rapid, solvent-free approach for preparing monolayers of (Tridecafluoro-1,1,2,2-tetrahydrooctyl)-1-dimethylchlorosilane on silicon oxide surfaces indicates potential for industrial applications in creating hydrophobic surfaces or modifying electronic materials' properties (G. Husseini, Eric T. Sevy, M. Asplund, Justin G. Peacock, M. Linford, 2002).

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